Tested for a full range of magnetrons and
processes (incl. reactive HiPIMS) at the Royal
Institute of Technology (KTH), Stockholm
Stable and robust discharge process (constant
voltage and no unwanted oscillations)
Externally triggered and can also be controlled in
master-slave configuration (multiple power
supplies)
The HiPSTER series offer an easy upgrade of an
existing magnetron deposition system to true
HiPIMS. If you already have a DC power supply
capable of delivering ~1000 V and ~6 kW then all
you need is the HiPSTER 6 unit.
If you also need a DC driving unit then please
have a look at the HiPSTER DCPSU:s and contact
us for a package deal.
Reactive HiPIMS process control option can be
implemented upon request. This feature allows:
Stable operation in the transition mode
Wide process window of reactive gas flow
with maintained stoichiometric composition
Average Power: 6000 W
Peak Voltage: 1000 V
Peak Current: 600 A
Regulation Modes: Voltage, Current, Power, Puls current
Pulse frequency: 1-10 000 Hz
Pulse Duration: 2.5 µs to 1000 µs
Arc control: reaction time < 2 µs
19″ rack (3U)
135 mm (H) x 483 mm (W) x 490mm (D)
Weight: ≈ 10kg
