The HEAT3-PS is used for resistive heating or electron bombardment heating. The power supply can also be used for effusion cell evaporators. The unit is equipped with a PID temperature controller.
Ramp heating function control sample temperature to protect sample from damage. Sample overheating can also be protected by setting the voltage and current limits. The unit can be operated in auto mode (with temperature control) or manual mode (without temperature control).
Supply voltage 100-130VAC/200-260 VAC, 50-60Hz (power consumption max 1600 W)
Resistive heating 45 V, 17 A – standard;
mode parameters other versions on request
EB heating 1000 V, 300 mA – standard;
mode parameters other versions on request
Temperature ▪ 273.15 K – 2473.15 K for type C thermocouple
range (dependent on sample holder type or evaporator)
▪ 73.15 K – 1645.15 K for type K thermocouple
▪ 1.4 K – 500 K for DT670/DT470 silicon diodes
(dependent on sample holder type and conditions in chamber)
Temperature 2 – for thermocouples K/C/E/N
independent 2 – for silicon diodes DT670/DT470
inputs
Temperature adjustable from 0.1° to 1000°/ s/min/h
setpoint ramp rate
ΔT setpoint 0.1 to 5.0°/s
Vacuum CTR90, TTR91, TTR211, PTR225, PTR90, ITR90,
measurement ITR100, Baratron, ANALOG IN, PG105,
(optional) MG13/14, PKR251, PCR280, ATMION
Communication RS232/485, Ethernet
interface
Communication MODBUS-TCP
protocol
User interface 7″ TFT display with touchscreen,digital encoder
Interface English, German, Polish
languages
Dimensions 448.8 × 132.5 × 375 mm (W×H×D),19″ rack mountable
Weight (approx.) 8.8 kg (for standard version)